AMIES SiC Laser Annealing

Name: AMIES SiC Laser Annealing
Brand: AMIES

SiC Laser Annealing for semiconductor and advanced packaging applications.

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Reference specifications.

Specifications are reference information; available configurations, performance and lead time are confirmed in your quotation. Manufacturer reference information; supply scope and configuration confirmed on enquiry.

Reference specifications
SiC substrate sizes	4 / 6 / 8 inches
Process chamber oxygen	<10 ppm
Wafer bow	Up to 5 mm

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AMIES SiC Laser Annealing

Reference specifications.

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